Metrology Challenges and Opportunities

ni logo

PMS-webinar-logo

Date: Wednesday, April 26, 2017 at 2 p.m. ET

Free to attend

Length: Approximately one hour

NEW register_button

Continued scaling and more complex device structures, including FinFETs and 3D stacking, are creating new challenges in metrology and characterization. In this webcast, hear from leading metrology expert Alain Diebold, who will discuss new challenges and opportunities in the field of semiconductor metrology, focusing on new transistor structures, nanoscale films and structures and how to use plasmonics with scatterometry to increase sensitivity to metal linewidth.

Speaker: 

Alain Diebold, Interim Dean, College of Nanoscale Sciences

Alain Diebold is Interim Dean at the Colleges of Nanoscale Science and Engineering (CNSE) SUNY Polytechnic Institute. He is also the Empire Innovation Professor of Nanoscale Science; Executive Director, Center for Nanoscale Metrology; and Executive Director, NC3. He is a fellow of the American Vacuum Society and SPIE as well as a senior member of the IEEE. He is an associate editor for IEEE’s Transactions on Semiconductor Manufacturing. Before moving to Albany, Alain was a Senior Fellow at SEMATECH.  Prior to moving to Austin, He was a senior chemist at Allied Signal in Morristown, NJ. Alain received his PhD from Purdue University in 1979.

Sponsored by National Instruments and Particle Measuring Systems, Inc.

National Instruments provides powerful, flexible technology solutions that accelerate productivity and drive rapid innovation. From daily tasks to grand challenges, NI helps engineers and scientists overcome complexity to exceed even their own expectations. Customers in nearly every industry—from healthcare and automotive to consumer electronics and particle physics—use NI’s integrated hardware and software platform to improve our world. To learn more, click here.

Particle Measuring Systems Inc. (PMS), a subsidiary of Spectris plc, is a global technology leader in contamination monitoring, the inventor of laser particle counting, and now is the leading provider of solutions for monitoring and controlling many forms of contamination that impact companies that manufacture in ultra-clean environments. Learn more at pmeasuring.com.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

LIVE NEWS FEED

NEW PRODUCTS

3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...
ULVAC launches NA-1500 dry etching system for 600mm advanced packaging systems
03/24/2017ULVAC, Inc. is pleased to announce the NA-1500 dry etching system for 600mm advanced packaging substrates, providing for u...
Astronics Test Systems announces new PXIe test instruments
01/24/2017Astronics Corporation, through its wholly-owned subsidiary Astronics Test Systems, introduced two new test instruments today. ...