Table of Contents

Solid State Technology

Year 2007
Issue 1


Compounding Corner

CleanRooms Webcast wrap-up

The CleanRooms Webcast, USP 797-Facts and Fallacies, which originally aired on October 18, 2006, focused on USP 797 and raised a number of questions-so many, in fact, that several went unanswered due to time constraints.

Your Market Analysis

Ultrapure water markets and technologies

In the semiconductor industry, ultrapure water is used for cleaning and etching of wafers. Wafer rinsing, in particular, is responsible for the largest consumption of ultrapure water in the wafer fab.

Setting The Standard

New challenges in contamination control

A leading industrial standards-writing organization since 1953, IEST has established seven tracks of Recommended Practices (RP) in the Standards and Practices (S&P) portion of the Contamination Control (CC) program, including the most recent program in Nanoscience and Nanotechnology.

From The Editor

No dodging this bullet

I don’t often use this page to highlight articles running in the issue-that’s why we have a cover and table of contents.



ISPE to work on implementation docs for ICH Q8 and Q9 guidelines

ISPE recently announced that it will collaborate with FDA to facilitate the implementation of the new quality guidelines (Q8 and Q9) developed by the International Conference on Harmonization (ICH).



News snippets from the world of contamination control.


Responding to flashy-and not so-competition

For disk-drive makers, contamination control is part of fighting the law, Hwang’s law to be precise.


Air sampler heads for the final frontier

In its current space mission on board the international space station (ISS), NASA is using air-sampling equipment from the Goettingen-based technology group Sartorius.


University receives garment donation

W. L. Gore & Associates, Inc. (Newark, DE) recently donated a supply of cleanroom garments to be used in the semiconductor research space of the Birck Nanotechnology Center’s Scifres Nanofabrication Laboratory, an ISO Class 3 (Class 1) facility at Purdue University.


Five new seminars at ESTECH 2007

This year’s ESTECH event, which will be held April 29-May 2 at the Indian Lakes Resort in Bloomingdale, IL, will feature a number of new seminars.



Relating statistics to particle counting measurements and standards

Statistics are the essence of cleanroom air cleanliness classification, yet the reasons behind this are often not well understood or appreciated.


Pharmaceutical microbiology: Harmonization of microbial limits test for nonsterile products

The United States Pharmacopeia (USP) is significantly changing the USP <61> Microbial Limits Test, effective August 1, 2007.

Special Report

Decontaminating the process

Whether it’s a maker of tools, filters, spaces, air quality monitors, or manufacturer of the wafers themselves, each member of the industry has a role to play in keeping the production environment clean.

Show Preview


February 1-2, 2007 - Puerto Rico Convention Center, San Juan


New Products

New Products

Each month, CleanRooms brings you a collection of the latest product innovations in the contamination-control industry.

Product Spotlight

Architects and designers

Building or renovating cleanroom, lab or clean manufacturing space requires careful consideration of many factors and requirements.