Dr. Steffen Schulz discusses the role of a flexible platform for computational lithography in a successful business strategy.
Several innovations in computational lithography have been developed in order to squeeze every possible process margin out of the lithography/patterning process. In this blog, Gandharv Bhatara of Mentor Graphicsl talks about two specific advances that are currently in deployment at 20nm.
Joe Kwan is the Product Marketing Manager for Calibre LFD and DFM Services at Mentor Graphics. He is also responsible for the management of Mentor’s Foundry Programs. He previously worked at VLSI Technology, COMPASS Design Automation, and Virtual Silicon. Joe received a BA in Computer Science from the University of California Berkeley and an MS in Electrical Engineering from Stanford University.
The long-expected demise of optical lithography for manufacturing ICs has been delayed again, even though the technology itself has reached a plateau with a numerical aperture of 1.35 and an exposure wavelength of 193nm. Immersion lithography is planned for the 20/22nm node, and with the continued delay of EUV, is now the plan of record for 14nm.
Who knew that mask process correction (MPC) would again become necessary for the manufacturing of deep ultraviolet (DUV) photomasks?