cvd-equipment

Topic Index

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CVD Source Materials

Thu, 12 Dec 2015
Reaction materials for chemical vapor deposition are typically delivered into the chamber in a gaseous form. The source materials can be gases or liquids.

Chemical Vapor Deposition

Fri, 12 Dec 2015
Chemical vapor deposition (CVD) is used to produce high-purity thin films.

Deposition equipment market witnesses a year of significant changes

Wed, 7 Jul 2015
There are four main segments in the thin-layer deposition equipment market – atomic layer deposition, chemical vapor deposition, epitaxy, and physical vapor deposition, also known as sputtering.

Nova selected by a leading foundry for its most advanced 10nm and 7nm FinFET nodes

Tue, 2 Feb 2016
Nova Measuring Instruments, a provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today that a leading foundry recently selected Nova's optical and X-ray metrology solutions for multiple process steps.

Veeco announces collaboration with imec to drive performance gains in GaN-based power devices

Tue, 2 Feb 2016
The collaboration is expected to accelerate the development of highly-efficient, Gallium Nitride (GaN) based, power electronic devices using GaN Epi wafers created using Veeco's Propel Power GaN MOCVD system.

Veeco launches new K475i As/P MOCVD system

Thu, 2 Feb 2016
Veeco Instruments Inc. announced today the launch of the new TurboDisc K475i Arsenic Phosphide MOCVD System for the production of red, orange, yellow light emitting diodes.

Nitrous oxide no laughing matter

Wed, 7 Jul 2016
N2O, or Nitrous Oxide, also known as laughing gas, is a weak anesthetic gas that has been in use since the late 18th century.

Understanding the impact of valve flow coefficient (Cv) in fluid systems

Tue, 9 Sep 2017
Understanding the impact of valve flow coefficient (Cv) in fluid systems for microelectronics manufacturing.