Thu, 12 Dec 2015
Reaction materials for chemical vapor deposition are typically delivered into the chamber in a gaseous form. The source materials can be gases or liquids.
Fri, 12 Dec 2015
Chemical vapor deposition (CVD) is used to produce high-purity thin films.
Wed, 7 Jul 2015
There are four main segments in the thin-layer deposition equipment market – atomic layer deposition, chemical vapor deposition, epitaxy, and physical vapor deposition, also known as sputtering.
Wed, 7 Jul 2016
N2O, or Nitrous Oxide, also known as laughing gas, is a weak anesthetic gas that has been in use since the late 18th century.