Wed, 5 May 2014
Thursday, April 23, 2015 at 12:00 p.m. EST
It is well recognized that dimensional scaling has reached its diminishing return phase. The industry is now looking at monolithic 3D to be the future technology driver. Yet, until recently, the path to monolithic 3D has required the development of new transistor types and processes. This Webcast will present game-changing monolithic 3D process flows which use the existing transistor of existing manufacturing line and existing process flows. Now the most effective path for future IC scaling is indeed monolithic 3D, which offers the lowest development and manufacturing cost for future ICs.
Thu, 5 May 2014
Thursday, April 30, 2015 at 1:00 p.m. EST
To understand 3-D FinFET doping and high mobility channel material, this talk will first review the current doping and Fin/channel mobility enhancement techniques used for 22nm FinFET production by Intel for both high performance logic and SOC devices and the changes they made for their 2nd generation 14nm FinFET.
Fri, 5 May 2014
Thursday May 28, 2015 at 1:00 p.m. EST
MEMS have quite different process and material requirements compared to mainstream microprocessor and memory types of devices. This webcast will explore the latest trends in MEMS devices – including sensor fusion, biosensors, energy harvesting – new manufacturing challenges and potential equipment and materials solutions to those challenges.
Wed, 6 Jun 2015
June 18, 2015 at 2:00 p.m. ETWith the rise of the mobile workforce, mobility is truly an ideal ‘lean’ enabler. In this session we will examine the top 10 areas where mobility can have the most impact on the success of your lean initiatives. Mobility is capable of stripping wasted time and errors out of virtually any process in any and all of your business functions, making mobility the ultimate platform to take your manufacturing operations to the next level of lean. Join us for this discussion on the factors to maximize lean strategies with mobile technologies.
Fri, 6 Jun 2015
July 29, 2015 at 2:00 p.m. ET
Yield improvement and production engineers working on today's ICs encounter many challenges as defects affecting device operation go undetected by traditional in-line techniques. Electrical Failure Analysis (EFA) is a suite of techniques that helps the modern day fab increase yields by isolating faults to areas small enough for Physical Failure Analysis (PFA). In this Webinar, we showcase a few of the proven EFA fault isolation techniques and describe how EFA helps to characterize the underlying defects.
Sat, 7 Jul 2015
August 6, 2015 at 1:00 p.m. ET
Jon Candelaria, Semiconductor Research Corp.’s director of interconnect and packaging sciences, will summarize a SEMICON West Semiconductor Technology Symposium Session focused on interconnects. He’ll describe the challenges for interconnect technology up to the end of the CMOS roadmap, and a few of the alternatives to address them. Next, he’ll discuss possible directions beyond the roadmap, as well as interconnectivity requirements and solution paths for emerging applications.
Mon, 8 Aug 2015
August 26, 2015 at 1:00 p.m. ETIncreasing IoT business opportunities drive a need for new packaging techniques such as FOWLP, Embedded Component Packaging, etc. Such new assembly techniques allow more components and functionality to be integrated into an ever decreasing package space. In parallel the faster product cycle drives the need for faster production ramp to stay competitive. All these challenges highlight the need for a better methodology to determine root cause of assembly-related defects during the new package process qualification process. We will demonstrate a totally non-destructive fault localization method based on a lock-in thermography with examples in these areas.
Tue, 9 Sep 2015
September 9, 2015 at 8:00 p.m. ETIn this presentation, recent developments in interconnects and packaging technologies that will enable mobile devices, and IoT will be discussed. Some of these packaging technologies include high density fan-out wafer level packaging, passive and active interposers, high throughput chip-on-wafer bonding, as well as wafer level chip scale packaging for MEMS and sensors.
Wed, 12 Dec 2015
December 16, 2015 at 12:00 p.m. ET
Flash memory has revolutionized the world of solid-state data storage, mainly because of the advent of NAND technology. However, from the technical point of view, this requires a major change in how these memories are being fabricated. This presentation will discuss this (r)evolution as well as its major scaling limitations.
Sun, 1 Jan 2016
January 19, 2016 at 1 p.m. ET
The age of the Internet of Things is upon us, with the expectation that tens of billions of devices will be connected to the internet by 2020. This explosion of devices will make our lives simpler, yet create an array of new challenges and opportunities in the semiconductor industry. At the sensor level, very small, inexpensive, low power devices will be gathering data and communicating with one another and the “cloud.” On the other hand, this will mean huge amounts of small, often unstructured data (such as video) will rippling through the network and the infrastructure. The need to convert that data into “information” will require a massive investment in data centers and leading edge semiconductor technology.
Fri, 4 Apr 2016
Thursday, April 14, 2016 at 1:00 p.m. ET / Sponsored by Park Systems
Continued scaling and more complex device structures, including FinFETs and 3D stacking, are creating new challenges in metrology and characterization. As the industry continues to explore new patterning methods, new phenomena further challenge metrology and characterization including pitch walking, stress relaxation in multilayer fins, and new device designs. New materials continue to be explored for transistor and interconnect applications. Here, the challenges facing materials characterization highlight the issues that will face in-line metrology when these materials transition to manufacturing.