Wed, 1 Jan 2016
Lithography is used to create a pattern on the wafer.
Wed, 1 Jan 2016
EUV lithography is on the threshold of becoming a mainstream patterning technology for sub-10nm chips, featured speaker Anthony Yen of Taiwan Semiconductor Manufacturing Co. (TSMC) will tell fellow attendees at SPIE Advanced Lithography 2016.
Tue, 12 Dec 2015
It is possible to fabricate copper pillars more than 100μm in height, with aspect ratios up to 6:1, using advanced packaging stepper lithography in conjunction with electroplating.
Fri, 11 Nov 2015
The availability of patterning alternatives in the lithography landscape represents a big opportunity to properly address the coming needs generated by the IoT.
Tue, 11 Nov 2015
Vistec Electron Beam GmbH, a supplier of electron-beam lithography systems, announced that it has established a show room facility in Schaumburg, IL to promote and demonstrate their Variable Shaped Beam systems specifically for the US and North America market.
eBeam Initiative survey shows rising optimism in EUV lithography, multi-beam technology for photomask productionTue, 9 Sep 2015
The eBeam Initiative announced the completion of its fourth annual eBeam Initiative members' perceptions survey.
EV Group ramps nanoimprint lithography into high-volume manufacturing with HERCULES NIL Track SystemTue, 7 Jul 2015
EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled the HERCULES NIL—a fully integrated track system that combines cleaning, resist coating and baking pre-processing steps with EVG's SmartNIL large-area nanoimprint lithography (NIL) process in a single platform.
Thu, 1 Jan 2016
Ultratech, Inc. and Qoniac GmbH announced that the companies are jointly developing a 3D lithography advanced process control (APC) solution for advanced 3D CMOS manufacturing.
Wed, 2 Feb 2016
EV Group (EVG) today announced that WIKA Group has placed an EVG HERCULES lithography track system into production for manufacturing pressure sensor devices.
Thu, 2 Feb 2016
Semiconductor lithographic use of Neon is increasing more rapidly than expected for several reasons including the delay of EUVL while demand for finer line width patterning is increasing.
Tue, 5 May 2016
The semiconductor industry is nothing if not persistent — it’s been working away at developing extreme ultraviolet lithography (EUVL) for many years.
Tue, 6 Jun 2017
EVG resist processing and lithography systems provide pre-processing solution to enable complete damage-free advanced dry plasma dicing on thin semiconductor wafers.