lithography-resource-guide

Topic Index

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Lithography

Wed, 1 Jan 2016
Lithography is used to create a pattern on the wafer.

EUV, multiple patterning, integrated circuits among topics for SPIE Advanced Lithography 2016

Wed, 1 Jan 2016
EUV lithography is on the threshold of becoming a mainstream patterning technology for sub-10nm chips, featured speaker Anthony Yen of Taiwan Semiconductor Manufacturing Co. (TSMC) will tell fellow attendees at SPIE Advanced Lithography 2016.

Advanced lithography and electroplating approach to form high-aspect ratio copper pillars

Tue, 12 Dec 2015
It is possible to fabricate copper pillars more than 100μm in height, with aspect ratios up to 6:1, using advanced packaging stepper lithography in conjunction with electroplating.

Lithography alternatives: Why are they essential?

Fri, 11 Nov 2015
The availability of patterning alternatives in the lithography landscape represents a big opportunity to properly address the coming needs generated by the IoT.

Vistec Electron Beam established US show room facility with Variable Shaped Beam Lithography system

Tue, 11 Nov 2015
Vistec Electron Beam GmbH, a supplier of electron-beam lithography systems, announced that it has established a show room facility in Schaumburg, IL to promote and demonstrate their Variable Shaped Beam systems specifically for the US and North America market.

eBeam Initiative survey shows rising optimism in EUV lithography, multi-beam technology for photomask production

Tue, 9 Sep 2015
The eBeam Initiative announced the completion of its fourth annual eBeam Initiative members' perceptions survey.

EV Group ramps nanoimprint lithography into high-volume manufacturing with HERCULES NIL Track System

Tue, 7 Jul 2015
EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled the HERCULES NIL—a fully integrated track system that combines cleaning, resist coating and baking pre-processing steps with EVG's SmartNIL large-area nanoimprint lithography (NIL) process in a single platform.

Ultratech and Qoniac jointly develop 3D lithography APC solution

Thu, 1 Jan 2016
Ultratech, Inc. and Qoniac GmbH announced that the companies are jointly developing a 3D lithography advanced process control (APC) solution for advanced 3D CMOS manufacturing.

WIKA Group adopts HERCULES lithography track system from EV Group

Wed, 2 Feb 2016
EV Group (EVG) today announced that WIKA Group has placed an EVG HERCULES lithography track system into production for manufacturing pressure sensor devices.

Neon shortage coming

Thu, 2 Feb 2016
Semiconductor lithographic use of Neon is increasing more rapidly than expected for several reasons including the delay of EUVL while demand for finer line width patterning is increasing.

EUVL: Taking it down to 5nm

Tue, 5 May 2016
The semiconductor industry is nothing if not persistent — it’s been working away at developing extreme ultraviolet lithography (EUVL) for many years.