Topic Index

A B C D E F G H I J K L M N O P Q R S T U V W X Y Z 0-9

450mm Status Report

Wed, 4 Apr 2013

Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business development director, Lode Lauwers, on why 450mm is important for Europe, and the status of 450mm research on processes and devices.

FREE WEBCAST: Light and Color Measurement of Today's LED Technology

Thu, 3 Mar 2011

The seminar is an ideal fit for anyone interested in characterizing and communicating the light and color properties of LED’s accurately.

FREE WEBCAST: Lens Tilt in Small Auto-Focus Cameras

Wed, 10 Oct 2011

This webinar will provide an introduction to miniature auto-focus camera technology and voice coil motors.

PVD Solutions for Next Generation MEMS and Sensors

Mon, 3 Mar 2012

As the industry is incorporating more MEMS devices with integrated magnetic sensors, they are encountering challenges that cannot be overcome with existing toolsets.  The deposition and magnetic alignment of these materials are critical for proper device performance and require special hardware configurations and process optimization.  

Innovation in Semiconductor Manufacturing Instrumentation

Tue, 3 Mar 2013

As the semiconductor industry moves toward smaller geometries, manufacturing processes are becoming more complex. In particular, they’re more demanding of all the variable parameters on a process tool, including process gas accuracy. Cutting down on variability in the process positively impacts productivity and yield.

3D and 2.5D Integration: A Status Report Live Event

Thu, 6 Jun 2012

This webcast will explore the present status of 2.5 and 3D integration, including TSV formation.

Issues Facing High Speed DRAM Frequency Scaling

Wed, 6 Jun 2010

It will also show some new multi-die DRAM package structures designed to offer improved electrical performance using the existing manufacturing infrastructure.

SST On the Scene at SEMICON West

The Next 10 Years: cost-effective lithography, managing R&D costs, scheduling invention, transitioning to 450mm wafers, and new business models.

Tue, 7 Jul 2006
With escalating R&D costs, economic challenges associated with lithography past the 32nm half-pitch, and increasing competition between countries and even regions within countries, industry executives have their hands full. Among the questions explored in 14 video interviews conducted at SEMICON West are the following:
  • Are finishing fabs the answer to the industry's economic challenges going forward?
  • Are ever-larger consortia and alliances feeling growing pains, or does size drive momentum for solutions?
  • As the government gets more involved in basic research, will you be happy that someone from the government is there to help you?
  • Will high-throughput e-beam direct write lithography be ready in time for 32nm half-pitch?
  • Is there a solution to the raw polysilicon availability crunch?
  • Are universities competing "too much" with industry?
  • Is scheduling invention possible?
Hear what industry executives have to say about these and other issues.

DFM Strategy for Yield Closure

Thu, 4 Apr 2006
Looking to improve your bottom line and maximize yield for your next design? This seminar covers the latest causes of yield problems and how the new Calibre DFM tools from Mentor Graphics can help you identify, analyze and modify your designs to increase yield. This seminar also includes a rundown on what Calibre is doing to address random, systematic and parametric yield problems.

SST On the Scene at the SPIE Microlithography Conference - 2006

Tue, 2 Feb 2006

Hear (and see!) what industry experts at the SPIE Microlithography Conference have to say about extending immersion, the readiness of EUV, and other topics.

Lithographers, maskmakers, and chemists have made great strides in identifying challenges and pursuing solutions that are expected to extend immersion lithography - perhaps to the 32nm half-pitch. Some of the topics our guests tackled include double patterning, CD overlay, using polarized light for specific orientations of features, and its impact on layout design. Guests' impressions of industry's progress in moving EUV along as a viable and cost-effective chip production technology are also shared with viewers, along with opinions about the important developments and papers at the show.

Surface Cleaning and Preparation

Thu, 5 May 2013

This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL process steps.  An additional challenge is that the reduction in device size and an increase in device topography makes the removal of small particles even more challenging.