February 14, 2001–El Dorado Hills, California–Rippey Corp., a global leader in semiconductor and rigid disk media critical cleaning products and technology, announced today that it has received three patents relating to the manufacture, packaging, and processes for producing their Rippey Microclean PVA products line. They are U.S. Patent Nos. 6,076,662; 6,120,616; and 6,158,448.
“The awarding of these three patents is recognition of Rippey Corp.’s extensive product and process research activities over the past 3 years to enhance critical cleaning processes for the semiconductor and rigid disk media industries,” says Dave Rippey, president and CEO. “Our PVA products have set the industry standard for mechanical brush scrubbing for over 19 years, and we have taken this proven technology to a new level through our development of the Rippey Microclean product line”.
Rippey Microclean PVA products are manufactured using a patented process developed by a technical engineering staff. The Rippey Microclean family of PVA products is designed to meet the increasing cleanliness requirements of semiconductor and rigid disk media manufacturers through reduced levels of trace metals and contaminates in automated critical cleaning processes.
“Rippey Microclean PVA products are designed to provide significant cost of ownership savings coupled with advances in process control and performance in the manufacturing of bare silicon wafers, IC devices and rigid disk media,” says Dan McMullen, vice president, Corporate Development. “Our commitment to total customer satisfaction via product development is one of the key factors in maintaining our worldwide leadership position as a provider of critical cleaning solutions for the high technology industry.”