Veeco, Photronics form relationship in next-generation photomask technology

Jan. 8, 2002 – Woodbury, NY- Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship focused on accelerating the development of advanced manufacturing technologies required to fabricate enhanced reticle and next generation lithography mask technologies.

The initial phase of the relationship includes the purchase of Veeco’s NEXUS Ion Beam Deposition (IBD) Low Defect Density (LDD) system for deposition of critical films by Photronics. The companies have also agreed to share technology roadmaps.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

NEW PRODUCTS

KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...