Cymer to open new facility
Oct. 23, 2002 – San Diego, CA – Cymer Inc. is to build a new manufacturing facility for its advanced lithography light sources, and will implement a new organizational structure. The new facility is designed to accommodate the high-volume production of the company’s light source portfolio. This will include the new XL Series product line, which utilizes the dual-gas-discharge-chamber Master Oscillator Power Amplifier (MOPA) architecture.
The facility will be approximately 265,000 sq ft and will house state-of-the-art manufacturing, assembly, testing and shipping capabilities, as well as a variety of associated operations functions and personnel. Completion of Phase I and initial occupancy of the new building is slated to occur in April 2003, and the final phase will be completed by the third calendar quarter of 2003. The total cost of the building is currently estimated at approximately $50 million, which will be paid from Cymer’s current cash accounts. Depreciation of the building, which will affect Cymer’s quarterly and annual operating statements, will begin upon occupancy.
The new business strategy comprises a realignment of Cymer’s corporate structure and reapportionment of its personnel into three highly focused core organizations: Lithography System Solutions, Semiconductor Manufacturing Solutions, and Emerging Technology and Applications. By addressing the advanced requirements of its customers — the photolithography systems providers and chipmakers — Cymer will broaden its product and service offerings and improve overall time-to-market for its excimer light sources used in the manufacture of semiconductors. The organizational changes are in effect now.