Jan. 28, 2003 – Leuven, Belgium – IMEC’s board of directors has announced the construction of a new 300mm cleanroom.
Construction of the new 2,200 square meter research fab will begin in February, with completion expected in approximately 18 months. The facility is expected to go on-line in mid 2005, with activities gradually ramping up.
The initiative involves an investment of 84 million euro ($91.2 million) of which 37.2 million euro has been granted by local government.
The new fab will be located adjacent to IMEC’s existing facilities to ensure and optimize the exchange of information and to share common facilities, infrastructure, and metrology tools.
IMEC will set up several research programs targeting the issues identified by the International Technology Roadmap for Semiconductors for the sub-45nm node. The focus will be on EUV lithography, new materials, advanced devices, and innovative interconnect schemes. The programs will be open for semiconductor companies and material and equipment suppliers worldwide.