SUSS Microtec unveils litho products

June 23, 2003 – SUSS Microtec, a supplier of production, process, and test technologies, has introduced a new line of lithography technologies for use in wafer-level packaging, MEMS, and optoelectronics.

Collectively called SupraYield, the set includes mask pellicle technology, a mask aligner, advanded photoresists and large clearfield mask movement.

SupraYield is designed to expose the entire wafer in one step, increasing throughput and reducing costs for lithography systems.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *


KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...