Sematech, Asahi Glass shake hands for EUV litho

July 3, 2003 – International Sematech (ISMT) and Asahi Glass Co. have signed an agreement to co-develop advanced mask technology and materials for use in EUV lithography.

Under terms of the deal, Asahi will provide ISMT with advanced mask materials, and send scientists to work with ISMT technologies at the consortium’s R&D facility at the University of Albany in New York. Asahi will also use ISMT’s Albany facility to work on its own commercial manufacturing efforts.

ISMT signed a five-year deal with the University of Albany to develop EUV infrastructure, including defect-free masks and special resists.

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