ASML unveils 193nm litho tool

April 20, 2004 – ASML, Veldhoven, The Netherlands, has taken the wraps off of its Twinscan XT:1400 lithography tool, used for 65nm volume production as well as development at the 45nm node.

The machine sports a numerical aperture of 0.93, and can be converted to utilize either dry or wet (immersion) lithography techniques.

Deliveries will be ready by December 2004, and an upgrade kit for immersion will be ready by 4Q05.

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