ASML, Micronic ink maskless litho deal

December 21, 2004 – Micronic Laser Systems AB, Taby, Sweden, has agreed to license its patents relating to spatial light modulator (SLM) and datapath technologies to ASML Netherlands BV for use in optical maskless lithography for semiconductor applications. Micronic will receive royalty payments plus 20 million euros against future royalties, as well as royalty-free rights to use ASML’s development of the SML technology.

Aside from royalty incomes, the deal also offers synergies concerning the development of future SML technologies for incorporation into Micronic’s “Sigma” brand laser pattern generators, stated Sven Lofquist, Micronic president and CEO.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

NEW PRODUCTS

KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...