December 7, 2004 – EV Group today announced the launch of a global consortium, NILCom, dedicated to commercializing advanced nanoimprint lithography (NIL) technologies. The consortium will have a technology platform supported by an established infrastructure and qualified processes, including leading technology companies and research centers.
The consortium’s mission is to establish a high volume manufacturing NIL platform in nanoelectronics, data storage, life sciences, and optoelectronics by creating a technology interface for qualifying and standardizing the related infrastructure.
NIL is a next-generation lithography method that utilizes a low-cost, high-resolution, and large-area patterning process, EV Group said.
“A recent report by Lux Research projected NIL to be the long-term winner among nanolithography platforms, and noted that toolmakers need to work together for our mutual interests,” said Dr. Peter Podesser, CEO of EV Group.
NILCom will facilitate transparency and availability of NIL requirements and infrastructure, including template standardization, materials qualification and advanced metrology solutions. Devices and applications developed with NILCom technology can take full advantage of the most advanced and cost efficient pattern-replication methods, promoting an accelerated product commercialization path.
NILCom members include:
Templates: IMS-Chips / Institut f