January 25, 2005 – Cymer Inc. has announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC’s 300mm wafer fab facility in Leuven, Belgium.
The tool integration marks the first milestone in the company’s participation in IMEC’s Industrial Affiliation Program (IIAP) on Advanced Lithography — aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.
Commenting on this milestone, Bob Akins, Cymer’s chairman and CEO stated, “We are excited about the opportunity be a part of IMEC’s IIAP to collectively ensure the availability of cost-effective immersion lithography process technology for industry adoption at the 45nm node.”
The XLA 105 is Cymer’s second-generation, leading-edge, ArF light source to feature the dual-chamber MOPA platform — providing lithography process engineers with the ultra line-narrowed and power requirements needed for today’s most advanced processes.
Commenting on Cymer’s participation in the IIAP on Advanced Lithography, Dr. Luc Van den hove, VP of IMEC, stated, “IMEC is pleased to welcome Cymer to the IIAP on Advanced Lithography…With Cymer’s participation, the IIAP will investigate how light sources can be used to further enhance the latitude of the lithographic processes to extend Moore’s law.”