December 8, 2005 – European R&D consortium IMEC is installing two 300mm coater/developer tools from Tokyo Electron Ltd. for use in EUV and 193nm immersion lithography work. The EUV work, part of IMEC’s Industrial Affiliation Program on EUV lithography and an extension of an existing IMEC-TEL partnership, will begin in January and run for three years. A TEL 193nm Clean Track Lithius i+ immersion system, based on earlier work with an installed TEL track tool, will be installed in 1Q06 and interfaced with ASML’s XT:1700i scanner slated for delivery early next year.
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