Brion, Crolles2 partners extend OPC work to 45nm

June 6, 2006 – Brion Technologies says it has completed initial joint development work with Crolles2 Alliance partners STMicroelectronics, Philips Semiconductors, and Freescale Semiconductor, incorporating its Tachyon LMC lithography manufacturability verification technology into production on a fully automated 65nm process flow.

The companies also have agreed to continue working to develop optical-proximity correction (OPC) technology for 45nm device fabrication. As part of this work, which began in April 2005, the Crolles2 Alliance has placed a follow-on order for additional Tachyon capacity, including both Tachyon LMC for 65nm & 45nm RET verification and Tachyon RDI design inspection for 90nm.

“Brion’s Tachyon LMC model-based, full-chip verification technology fundamentally changes how we approach production of 65nm designs,” said Jo


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