Hoya selects Applied Materials’ etch tool

June 5, 2006 – Applied Materials (Nasdaq:AMAT) announced that Hoya Corporation has selected its Applied Tetra II Mask Etch system for 65nm mask applications at Hoya. Hoya Corporation is among the world’s largest supplier of photomasks used in semiconductor and LCD production.

The tool is scheduled for installation at Hoya in mid-2006, in the company’s Hachioji, Japan, facility.

Applied Materials makes nanomanufacturing technology solutions for the electronics industry, including equipment, service and software products.


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