JEOL doubling e-beam tool output

June 5, 2006 – JEOL Ltd. is investing 1.8 billion yen (about US $16 million) to build a new facility that will double its production of electron-beam lithography equipment, according to the Nikkei Business Daily

The company is adding a new facility at its site in Akishima, Tokyo, to double production capacity to about 30 units/year. The four-story structure initially will use the first and second floors for cleanroom facilities, with construction starting next month and projected opening by next summer.

The increased output will include both production-grade mask electron-beam equipment, as well as spot electron-beam lithography equipment used in R&D work, the paper noted.


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