Temperature Control In Wet Cleaning Process Systems Using High-Performance Perfluorinated Heat Exchanger

Many wet etch and clean processes for wafer surface cleaning require temperature conditioning of cleaning chemicals. Heat exchangers are generally used for the temperature conditioning of semiconductor liquids. In this paper we discuss the design and performance of a new, all-fluoropolymer pHasor&#174 X heat exchanger that has a high-heat transfer area, enhanced flow distribution and small hold up volume. Also described are examples of temperature control systems incorporating this device for precise temperature control.



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