October 30, 2006 – Weeks after a preliminary announcement, Fujitsu Ltd. and Advantest Corp. are offering more details about their plan to develop an electron beam direct lithography to use with Fujitsu’s 65nm and 45nm process technologies.
The new JV, e-Shuttle Inc., will be launched on Nov. 1 within Fujitsu’s facilities in Kawasaki, Japan, to provide prototyping large-scale integrated circuit (LSI) services for 65nm process technologies, utilizing e-beam direct lithography through Advantest’s F3000 e-beam exposure system. e-Shuttle’s 65nm process prototyping services will be formally offered starting in mid-2007, with a 45nm process service to come “in the future.”
e-Shuttle also may eventually take over Fujitsu’s existing SiExpress prototyping services that use optical lithography, the companies stated.
The JV has been capitalized with 100 million yen (US $850K), projecting growth to 2.5 billion yen ($21.3 million) by fiscal 2007. Fujitsu is the majority 55%-owner of the JV.