Kebaili’s compact reverse pulse plating controller targets MEMS and nanotech R&D.


Kebaili says its CPG-500 is cost effective for a range of R&D applications. (Photo: Kebaili Corp.)

April 2, 2007 — Kebaili Corp., Laguna Beach, Calif., has released its CPG-500 Series, which it calls the first compact current pulse generator designed specifically for electrodeposition applications such as DC plating, pulse plating, and periodic reverse pulse plating. The product targets MEMS and nanotechnology development.

According to Dr. Mo Kebaili, Chief Technology Officer of Kebaili Corporation, commercially available reverse pulse plating systems and potentiostat/galvanostat are typically large and usually not optimized for cleanroom environments. Kebaili designed the CPG-500 to be ergonomic and compact, and optimized it for end-user applications in MEMS and nanotechnologies.

The CPG-500’s power requirement is 100-240 V AC at 50-60 Hz. The unit is microprocessor-controlled, user programmable, and self-contained (doe not require connection to a PC). Further, it promises to be user friendly.

CPG-500 can generate forward and reverse current pulses from 1 microamp to 350 milliamps, with a minimum pulse width of 1 msec. The compliance voltage is ± 10 Volts. The user can program 10 pulse waveforms and store the recipes in the CPG-500 internal non-volatile memory.

Kebaili says the CPG-500 is cost effective for a wide range of research and development applications, and laboratory requirements, such as:

1. Reducing porosity and intrinsic stress, improving uniformity, increasing hardness and decreasing grain size of electroplated thin-films for physical, chemical, biological transducers and microsensors.

2. Silicon wafer through holes void free metallization of high aspect ratio microvias in microelectronic and microtechnology applications.

3. Metallic and alloy nanowires synthesis by electroplating through anodized aluminum templates in nanotechnology applications.

4. Micro-molds, micro-coils and metallic microstructures fabrication.

5. Electrodes fabrication for thin-film-based micro-batteries.

6. Micro-metallization in microfluidic devices and high aspect ratio micro-channel in biochip applications.

7. Platinum catalyst electrodeposition on polymeric exchange membrane (PEM) in micro fuel cell applications.

8. Microstructures fabrication for micro analytical instruments, and micro chemical plants.

9. Electrochemical deposition of bismuth telluride thin-films for micro-thermo electric cooling applications.

10. Electrodeposition of cobalt in anodized aluminum template as a precursor catalyst for carbon nanotubes synthesis by chemical vapor deposition (CVD).

Kebaili Corporation designs, manufactures, and markets a full line of instruments based on its MEMS/NEMS sensor technologies that are used for research and development in industrial, medical, military, automotive, and consumer applications.

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