SEMATECH, Veeco push EUV tool efforts

April 23, 2007 – SEMATECH is funding an additional $2.4 million project to support Veeco Instruments Inc.’s R&D of its ion beam deposition tool for use in extreme ultraviolet (EUV) lithography, part of SEMATECH’s Mask Blank Development Center at the U. of Albany campus in New York.

“This latest project with Veeco, in concert with the hundreds of New York companies we are working with, is serving to accelerate the research and development that is vital both to the future of EUV lithography and the global nanoelectronics industry,” stated SEMATECH president/CEO Michael Polcari.

Veeco has received nearly $19 million in funding to date for its ion beam products and R&D, which are used to fabricate mask blank.


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