ASML selects Cymer as EUV source supplier for HVM

July 18, 2007 – At SEMICON West 2007, ASML Holding NV (ASML) has selected Cymer Inc. as the extreme ultraviolet (EUV) source supplier for ASML’s EUV scanners for high-volume manufacturing (HVM). Cymer disclosed that it has signed a multi-year, multi-unit EUV source agreement with the first shipment scheduled for late 2008.

“After nearly a decade of research and development in EUV source technologies, we are pleased to announce achievement of our 50W instantaneous power milestone on schedule last month and that we are on track to higher required levels of performance,” said Bob Akins, co-founder and CEO of Cymer. “Together with ASML, Cymer is committed to commercializing EUV source technology to ensure the availability of sub-32nm exposure tools.”

“Cymer’s commitment to commercializing EUV light source technology is evidenced by its significant advancements in laser produced plasma (LPP) technology,” said Martin van den Brink, executive VP of marketing and technology at ASML. “We are confident that Cymer will help us make production-worthy EUV lithography a reality, clearing the way for semiconductor manufacturers to image ever-smaller features on chips. The sources delivered to ASML have the potential to expose 100 wafers per hour, which is required for cost effective EUV chip manufacturing.”

Cymer has reached all of its EUV power performance milestones using an LPP system consisting of a multi-staged carbon dioxide CO2 laser and a tin droplet target, which has been in operation since June 2006.

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