Carl Zeiss announces new 248nm litho system for 80nm resolution

July 18, 2007 – Carl Zeiss SMT AG announced at SEMICON West today its new optical lithography system for KrF, the Starlith 1000, with a numerical aperture (NA) of 0.93, which will reportedly be the highest NA for 248nm exposure wavelength available in the market.

The high NA is said to provide a more cost-effective solution for patterning of features down to 80nm in volume chip production. The Starlith 1000 system will be part of ASML’s new TWINSCAN XT:1000, which will begin shipping next year.

“Together with our strategic partner ASML, we have investigated customer needs, initiating the development of Starlith 1000. With Starlith 1000, the application range of KrF lithography is further extended,” said Winfried Kaiser, VP, product strategy at Carl Zeiss SMT’s Lithography Optics Division.

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