SUSS MicroTec now offers a nanoimprint toolkit that reportedly enhances the capabilities of its manual mask aligners by enabling them to pattern large areas with repeatable sub-50nm printing capability. The technology, substrate conformal imprint lithography (SCIL)was developed by Philips Research, (Eindhoven/The Netherlands) and transferred to SUSS MicroTec in a technology license agreement.
SCIL bridges the resolution gap between small rigid stamp nano-imprint lithography (NIL) application (best resolution) and large-area soft stamp usage, which has limited printing resolution below 200nm. Its performance in terms of substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool for applications like high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation hard disc drives. The SCIL toolkit can be field-installed on any SUSS MA6/8 Mask Aligner. SUSS MicroTec Garching, Germany; www.suss.com