Nanoimprint Toolkit for Mask Aligners

SUSS MicroTec now offers a nanoimprint toolkit that reportedly enhances the capabilities of its manual mask aligners by enabling them to pattern large areas with repeatable sub-50nm printing capability. The technology, substrate conformal imprint lithography (SCIL)was developed by Philips Research, (Eindhoven/The Netherlands) and transferred to SUSS MicroTec in a technology license agreement.

SCIL bridges the resolution gap between small rigid stamp nano-imprint lithography (NIL) application (best resolution) and large-area soft stamp usage, which has limited printing resolution below 200nm. Its performance in terms of substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool for applications like high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation hard disc drives. The SCIL toolkit can be field-installed on any SUSS MA6/8 Mask Aligner. SUSS MicroTec Garching, Germany; www.suss.com

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

NEW PRODUCTS

KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...