Cymer’s ArF lithography gas control ups productivity, drops fluorine gas consumption

November 29, 2011 – PRNewswire — Cymer Inc. (Nasdaq:CYMI) revealed the third-generation Gas Lifetime eXtension (iGLX) control system for argon fluoride (ArF) immersion light sources used in semiconductor lithography.

The feature is designed to double gas lifetime and automate gas optimization, avoiding manual intervention between service events. iGLX also reduces the consumption of fluorine gas by up to 20%. At high-utilization wafer fab sites, iGLX can provide an additional 9-16 hours productivity per light source each year.

iGLX is currently available to OnPulse customers on ArF immersion light sources as a field upgrade.

Cymer Inc. (Nasdaq:CYMI) develops light sources used by chipmakers worldwide to pattern advanced semiconductor chips, and is pioneering a new silicon crystallization tool for the display industry. Please visit www.cymer.com.

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