January 24, 2012 – PRNewswire-USNewswire — 4Wave Inc., thin film equipment maker, received several orders at the end of 2011 for its 200mm Ion Beam Sputtering systems, to be used in micro electro mechanical systems (MEMS) manufacture at semiconductor foundries.
4Wave’s Ion Beam Sputtering system can atomically deposit dielectric material for MEMS devices, allowing the user to select the optical characteristics of the film deposited. 4Wave’s system is designed to process 200mm wafers in a 24/7 manufacturing environment.
4Wave provides ion beam thin film processing equipment and coatings services to meet challenging thin film processing requirements. Using its atomic layer processing capabilities, 4Wave also offers multilayer device fabrication and miniature optical components. Learn more at www.4waveinc.com.