MEMS foundries order 4Wave ion beam sputtering tools

January 24, 2012 – PRNewswire-USNewswire — 4Wave Inc., thin film equipment maker, received several orders at the end of 2011 for its 200mm Ion Beam Sputtering systems, to be used in micro electro mechanical systems (MEMS) manufacture at semiconductor foundries.

4Wave’s Ion Beam Sputtering system can atomically deposit dielectric material for MEMS devices, allowing the user to select the optical characteristics of the film deposited. 4Wave’s system is designed to process 200mm wafers in a 24/7 manufacturing environment.

Also read: Semiconductor sputtering targets headed for 2012 market peak

4Wave provides ion beam thin film processing equipment and coatings services to meet challenging thin film processing requirements. Using its atomic layer processing capabilities, 4Wave also offers multilayer device fabrication and miniature optical components. Learn more at www.4waveinc.com.

View recent issues of the MEMS Direct newsletter

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

NEW PRODUCTS

KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...