AIXTRON installs high-capacity epitaxy system at Epistar for LED fab

February 29, 2012 — Epistar, a leading manufacturer of optoelectronic materials and devices, installed its first AIXTRON SE CRIUS II-XL system in a 19 x 4" wafer configuration to mass produce ultra-high-brightness (UHB) blue and white light emitting diodes (LEDs).

The CRIUS II-XL close coupled showerhead (CCS) multi-wafer metal-organic chemical vapor deposition (MOCVD) reactor system successfully passed the process demonstration and acceptance test at Epistar, and will now be qualified in mass production. Epistar plan to purchase more CRIUS II-XL systems when they expand their production capacity. Dr. Bernd Schulte, COO of AIXTRON, expects the tools to increase yield and directly translate into enhanced competitiveness for Epistar’s products.

The CCS technology is used in AIXTRON’s current range of reactors. Reagents are introduced into the reactor through a water-cooled showerhead surface over the entire area of deposition. The showerhead is close to the substrates and is designed to enable precursors to be separated right up to the point where they are injected onto the substrates through a multiplicity of small tubes. The reagents are injected into the reactor chamber through separate orifices in a water-cooled showerhead injector, to create a very uniform distribution of reagent gases. Substrates are placed on top of a rotating susceptor, which is resistively heated. The three-zone heater enables adjustment of the temperature profile to provide temperature uniformity over the susceptor diameter.

Located at the Hsinchu Science-based Industrial Park in Taiwan, Epistar Corporation develops, manufactures, and markets UHB LEDs. Also read: SemiLEDs, LG Siltron, Epistar install Veeco MOCVD tools

For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6; NASDAQ: AIXG, ISIN US0096061041), visit

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