AIXTRON opens MOCVD training center in China

March 16, 2012 — AIXTRON SE (FSE:AIXA, NASDAQ:AIXG) opened a training and demonstration center at SINANO – the Suzhou Institute for Nanotechnology and Nanobionics in China. The center will bring metal-organic chemical vapor deposition (MOCVD) knowledge to future semiconductor and light emitting diode (LED) manufacturing professionals. The center is located in the Suzhou Industrial Park.

AIXTRON plans to combine industrial and institutional research at the MOCVD center, offering high-quality training on the latest microelectronics manufacturing processes. Training courses will use AIXTRON’s latest generation CRIUS II-XL and AIX G5 HT systems in a production cleanroom environment, laboratories, and classroom training facilities that occupy a total area of 350sq.m. The goal is better MOCVD system utilization times and higher yields through operational efficiency, maintenance routines, process optimization and fab management, said Dr. Nicolas Muesgens, director of the AIXTRON Training and Demonstration Center. The Suzhou center will also pay special attention to operational health and safety issues and to environmental protection, adhering to and promoting German, international, and Chinese product-safety and waste-management standards.

A cooperative agreement between AIXTRON and SINANO will facilitate the full process and characterization of LEDs. The goal is to improve the quality, effeciency, and cost of China’s domestically produced LEDs, aligned with the government’s goal of global LED leadership, said a spokesperson for SINANO. Chinese customers will gain deep process knowledge at the new center. Applications to attend a training course can be submitted at www.aixtron.com/Service/Training.

China is encouraging LED lighting at the national and regional level, noted AIXTRON president and CEO Paul Hyland. The center will bring the "very latest AIXTRON technologies" to customers in this field, along with high-quality training for LEDs and other nanotechnologies such as gallium nitride on silion (GaN-on-Si) development, he said.

An opening ceremony welcomed the German Consul General in China, a representative of the National Development and Reform Commission (NDRC), many AIXTRON customers, and university and research institute partners from across Greater China.

AIXTRON provides MOCVD production technologies for semiconductor devices, such as LEDs, lasers, transistors and solar cells. For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6, DE000A1MMEF7; NASDAQ: AIXG, ISIN US0096061041), see www.aixtron.com.

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