Oxford Instruments increases throughput on plasma etch and deposition tool

July 16, 2012 — Oxford Instruments launched the PlasmaPro 100 etch and deposition tool for manufacturing micro electro mechanical systems (MEMS), high-brightness light-emitting diodes (HB-LED), semiconductors, and other applications.

Deposition rate for high-quality SiO2 and SiNx improved with changes to the plasma-enhanced chemical vapor deposition (PECVD) hardware, which also reduces cleaning overhead. The latest generation of Cobra ICP source improves etch rate and feature control capability.

The tool’s robotic handler optimizes processes. Combined with the system’s control and software interface, this improves diagnostics, reliability and serviceability, the company reports.

The PlasmaPro 100 is configurable with process chambers as stand-alone modules or clusters. Users can access over 6,000 process recipes through Oxford Instruments.

Oxford Instruments specializes in the design, manufacture and support of high-tech tools and systems for industry research. Learn more at www.oxford-instruments.com.

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