Laser nanofabrication for mass production at the nanoscale

August 10, 2012 — Laser nanofabrication can now meet the needs of submicron and nanoscale feature size manufacturing, and can operate in air, vacuum, or liquid processes. Sister publication Industrial Laser Solutions recently published Laser nanofabrication: A route toward next-generation mass production, by professors at the Singapore University of Technology and Design and National University of Singapore.

The article describes laser-based manufacturing processes being used for sub-20nm industrial fabrication, including on silicon substrates.

These manufacturing techniques could enable maskless semiconductor patterning or new micro electro mechanical system (MEMS) designs, as well as a lower-cost method to form through-silicon vias (TSVs) and interposers for advanced packaging.

Figure. a) Metallic nano-dot array being embedded in a silicon substrate. b) Nano-pillar array fabricated by laser interference lithography (LIL).

Check out the article at


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *


KLA-Tencor announces new defect inspection systems
07/12/2018KLA-Tencor Corporation announced two new defect inspection products at SEMICON West this week, addressing two key challenges in tool and process monit...
3D-Micromac unveils laser-based high-volume sample preparation solution for semiconductor failure analysis
07/09/2018microPREP 2.0 provides order of magnitude time and cost savings compared to traditional sample...
Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...