August 10, 2012 — Laser nanofabrication can now meet the needs of submicron and nanoscale feature size manufacturing, and can operate in air, vacuum, or liquid processes. Sister publication Industrial Laser Solutions recently published Laser nanofabrication: A route toward next-generation mass production, by professors at the Singapore University of Technology and Design and National University of Singapore.
The article describes laser-based manufacturing processes being used for sub-20nm industrial fabrication, including on silicon substrates.
These manufacturing techniques could enable maskless semiconductor patterning or new micro electro mechanical system (MEMS) designs, as well as a lower-cost method to form through-silicon vias (TSVs) and interposers for advanced packaging.
|Figure. a) Metallic nano-dot array being embedded in a silicon substrate. b) Nano-pillar array fabricated by laser interference lithography (LIL).|
Check out the article at http://online.qmags.com/ILS0712/#pg21&mode2