Date: Date and time TBD
Free to attend
Length: Approximately one hour
Registration coming soon.
EUV lithography has been under intense development for years and appears to be close to production. Yet its delay has the industry searching for alternatives, including double, triple and even quadruple patterning, directed self-assembly, multi-e-beam and nanoimprint. In this webcast, experts will detail various options, future scenarios and challenges that must still be overcome.
Contact Jenna Johnson about sponsorship opportunities for this event.