Nova and Leti collaborate to enhance process control schemes for advanced lithography

Leti, an institute of CEA Tech, and Nova Measuring Instruments (Nasdaq:  NVMI), a provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today a joint program to develop innovative metrology methods to enable leading-edge process control solutions for multi e-beam and directed self-assembly (DSA) advanced lithography techniques. Based on this new joint initiative, Nova has already installed its advanced suite of products at Leti’s state-of-the-art facility in France.

In order to meet the fabrication process challenges at the most advanced technology nodes, several lithography technologies are currently evaluated beyond mainstream multi-patterning optical lithography. The main alternatives to be considered include DSA and multi-beam direct-write lithography (ML2). The joint program between Leti and Nova will focus on developing innovative process-control solutions to address the challenges related to these new patterning methods. The collaboration will utilize Nova’s T600 multi-channel stand-alone optical metrology platform combined with its innovative MARS modeling software and the recently introduced Hybrid solution, which combines several measurements from different metrology platforms.

“Nova is Leti’s ideal partner for this strategic collaboration,” said Fabrice Geiger, head of Leti’s Silicon Technologies Division. “Nova’s state-of-the-art innovative metrology solutions, including its unique capability to hybridize measurements, are essential to speed up the qualification and ramp up of these new lithography technologies, and therefore to reduce their time-to-market introduction.”

“We are excited with the opportunity to work in partnership with Leti, join the IMAGINE and IDEAL programs, and demonstrate the value of our metrology solutions for early-stage R&D,” said Dr. Shay Wolfling, Nova’s CTO. “Such collaboration, early in the development cycle, is part of Nova’s stated long-term strategy and allows us to align our technology roadmap accordingly, in order to contribute later on to our customers’ success.”


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