Entegris launches ultra clean filter for semiconductor manufacturing Entegris, Inc. announced the latest addition to its Torrento family of ultra clean liquid filtration solutions used in the semiconductor manufacturing process. The Torrento X Series is the first commercial nondewetting all PTFE filter with 10nm particle retention for advanced wet etch and clean applications. “As the industry ramps to sub-2X nm manufacturing processes, enhanced cleanliness requirements have become a necessity to reduce particle defectivity and minimize metal contaminants that impact wafer yields,” said Todd Edlund, senior vice president and general manager of Entegris’ Critical Materials Handling Business. “Our new Torrento filter can enable integrated device manufactures to efficiently scale-up and produce more advanced devices.” Torrento X series filters facilitate “drop-in replacement” of new or existing filters, enabling greater installation flexibility and reducing overall operational costs. The field-proven high-flux membrane filter comes standard with ultra-low metallic cleanliness technology (UCM) to minimize the most challenging contaminants in advanced semiconductor fabs. Entegris also offers an Extreme-Ultra Clean Membrane (X-UCM) option with a higher level of cleanliness compared to any prior generation of PTFE filters with faster start up times and superior retention ratings. The Torrento X series with 10nm retention, as well as other technology leading contamination control and substrate handling solutions will be featured at the Company’s hospitality suite at the W Hotel in San Francisco, Ca from July 8 through July 10, 2014, which is concurrent with SEMICON West held at the Moscone Center.