Gigaphoton develops CO2 drive laser for high output EUV light sources

Gigaphoton Inc., a lithography light source manufacturer, announced today that the company has jointly developed a high power CO2 drive laser for Extreme Ultraviolet (EUV) light sources with Mitsubishi Electric Corporation, a manufacturer of electrical and electronic equipment. Likewise, an average output level of 15W was achieved on a development EUV system – representing another step forward in realizing production level EUV light sources.

Read more: Still a tale of two paths: Lithography at SEMICON West 2013

The 15W EUV light output was confirmed on a prototype EUV light source. Furthermore, initial experiments conducted on the jointly developed CO2 drive laser have produced output power of over 20kW, signifying that a key piece of technology necessary for producing EUV output levels of 250W which is necessary for high volume manufacturing (HVM) has been realized.

Gigaphoton has focused on developing high output, stable, and economical LPP light sources since 2002. During that time, Gigaphoton has introduced several unique technologies that have received industry-wide attention. The recent achievements can be attributed to Gigaphoton’s highly advanced technical capabilities, bringing the company one step closer to achieving mass production of LPP light sources.

“I am very pleased that the CO2 driver laser jointly developed with Mitsubishi Electric Corporation has demonstrated sufficient output levels necessary for production and that our unique LPP light source technology is showing firm progress towards high volume production level output” said Hitoshi Tomaru, President and CEO of Gigaphoton. “This also demonstrates progress towards realizing our vision for a Green, environmentally friendly LPP light source. Our efforts will help to bring the industry closer to realizing EUV lithography scanners for high volume manufacturing.”

Gigaphoton is striving to offer the most environmentally friendly, cost effective, and powerful EUV light source possible through unique technologies such as double pulse laser produced plasma (LPP) and debris mitigation using superconducting magnets.

Tin (Sn) droplets are irradiated using a high-energy pulse driver laser to create Tin plasma which is used to generate the EUV light. Improving the conversion efficiency of the EUV light generation and achieving efficient and effective mitigation of debris from the collector mirror are key issues that must be resolved for production level EUV light sources.

Highly efficient EUV output is possible through Gigaphoton’s unique technology based on the optimized use of a short wavelength solid-state pre-pulse laser in conjunction with a CO2 main pulse laser. Efficient and effective debris mitigation is also possible through Gigaphoton’s unique method of utilizing a superconducting magnet to generate a powerful magnetic field that guides the unwanted debris resulting from the thermal expansion of the Tin droplets towards the Tin catcher. This results in further reduction of cost and downtime.

Gigaphoton will continue to pursue breakthrough achievements in technology to bring the industry closer to realizing EUV lithography tools for high volume manufacturing.


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