Ultratech Cambridge NanoTech ships 400th ALD system

Ultratech, Inc., a supplier of lithography, laser­-processing and inspection systems used to manufacture semiconductor devices and high-­brightness LEDs (HB­-LEDs), as well as atomic layer deposition (ALD) systems, announced that its Cambridge NanoTech business unit, Ultratech-CNT, has shipped its 400th ALD system. The system was purchased by the University of Michigan.

Dr. Neil Dasgupta, Assistant Professor of Mechanical Engineering at University of Michigan, whose group received the ALD equipment, said, “Ultratech-CNT’s ALD system has provided a significant boost to our research productivity, enabling us to make rapid advances in the field of surface and interfacial modification of energy conversion devices, including batteries, solar cells, and catalysts. The versatility of the ALD system to address the varied needs of our research program, coupled with the depth of knowledge of their science and engineering team, has enabled us to move very quickly towards producing high-impact research. We are happy to be part of this significant milestone in receiving the 400th system, and we look forward to developing a strong relationship with Ultratech-CNT.”

Ultratech-CNT Vice-President of Research and Engineering, Ganesh Sundaram, Ph.D., said, “It has always been about the scientist and researcher, and about making them successful in achieving their research goals.  We are extremely gratified by Professor Dasgupta’s decision to purchase our ALD system.  We have known his work since his days as a graduate student at Stanford University, and he has consistently produced noteworthy results using ALD. Looking forward, we are excited by the prospects of the breakthroughs in science that he, along with all other researchers, will be making using our instruments.  For our part, we celebrate the shipment of our 400th system and will continue our tradition of providing deep expertise combined with exciting technology.”

Ultratech-CNT’s ALD Systems: 

Savannah G2 ALD System
The Savannah G2 platform incorporates a wide range of advanced field-upgradable options intended to aid serious researchers in expanding their portfolio of available ALD films, as well as allow them to characterize the films in real time.

Phoenix G2 Batch ALD System
Engineered for high throughput, the Phoenix provides maximum uptime in any fabrication environment from pilot production to industrial-grade manufacturing. Technologists and researchers rely on the Phoenix for repeatable, highly-accurate film deposition on flat and 3-D substrates alike for batch production ALD requirements.

Fiji High-Vacuum ALD System
A modular, high-vacuum ALD system, the Fiji series accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The result is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.

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