Date: February 2015 (Date and time TBD)
Free to attend
Length: Approximately one hour
Registration will be available soon. Click here to pre-register.
FinFETs provide better performance than planar transistor architectures, but the entire 3D structure requires strict process control, including fin and gate dimensions, profiles and roughness, and metal gate undercuts. As more advanced node semiconductors enter production, the application of HKMG will be key to yield and cost improvement. Advanced wafer fab tools are needed for HKMG, such as ALD.
Want to sponsor this webcast? Contact Sabrina Straub.