Lithography

Date: September 2015 (Date and time TBD)

Free to attend

Length: Approximately one hour

Registration will be available soon. Please click here to pre-register.

EUV lithography has been under intense development for years and appears to be close to production. Yet its delay has the industry searching for alternatives, including double, triple and even quadruple patterning, directed self-assembly, multi-e-beam and nanoimprint. In this webcast, experts will detail various options, future scenarios and challenges that must still be overcome.

Interested in sponsoring this webcast? Contact Sabrina Straub.

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