Date: July 28, 2016 at 10 AM MT
Free to attend
Length: Approximately one hour
Decreasing the time to detect, contain and mitigate very low levels of Airborne Molecular Contamination (AMC) is critical for high tech manufacturers. Costs associated with AMC-related quality issues and yield losses are well understood, and adequate reduction of AMC is critical for clean manufacturers to stay competitive.
Technical personnel need the flexibility to efficiently collect AMC data with good temporal-spatial resolution anywhere in the clean environment for both sustaining sample plans, as well as to collect site-specific data to converge on AMC sources during troubleshooting events. A brief overview of AMC will be presented along with the latest technology for efficiently identifying AMC sources in the cleanroom.
Dr. Dan Rodier has a Ph.D. in analytical chemistry from the University of Colorado and has over 25 years of experience developing and implementing technologies and strategies to measure airborne molecular species and particulate contamination. He has worked with customers across Asia, Europe, and North America to implement monitoring programs in the semiconductor, disk drive, and display industries.
Sponsored by Particle Measuring Systems Inc.
Particle Measuring Systems Inc. (PMS), a subsidiary of Spectris plc, is a global technology leader in contamination monitoring, the inventor of laser particle counting, and now is the leading provider of solutions for monitoring and controlling many forms of contamination that impact companies that manufacture in ultra-clean environments. Learn more at pmeasuring.com.