Topic Index

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CVD Source Materials

Thu, 12 Dec 2015
Reaction materials for chemical vapor deposition are typically delivered into the chamber in a gaseous form. The source materials can be gases or liquids.

Chemical Vapor Deposition

Fri, 12 Dec 2015
Chemical vapor deposition (CVD) is used to produce high-purity thin films.

Atomic layer deposition goes mainstream in 22nm logic technologies

Mon, 11 Nov 2010
Cost-of-ownership (COO) will be a main driver for ALD equipment selection in cost-sensitive markets; and in foundry or other logic applications, equipment choice is more a mix between COO, turn-around time and process performance considerations. M. Verghese, ASM, Phoenix, AZ USA; J. W. Maes, ASM, Leuven, Belgium; N. Kobayashi, ASM, Tokyo, Japan

ASM plasma-enhanced atomic layer deposition (ALD) ordered for HVM, new app

Thu, 4 Apr 2011

ASM International N.V. (NASDAQ: ASMI) received multiple system orders for its plasma enhanced atomic layer deposition (PEALD) reactor from a leading memory customer in Asia. The company also qualified a new PEALD oxide application with a memory manufacturer for the 2X nm node.

Stanford researchers advance area selective ALD to develop more energy efficient electronics

Tue, 1 Jan 2016
Stanford University researchers sponsored by Semiconductor Research Corporation (SRC) have developed a new area selective atomic layer deposition (ALD) process that promises to accelerate the manufacturing of higher performing, more energy efficient semiconductors.

Understanding ALD, MLD and SAMs as they enter the fab

Thu, 3 Mar 2018
As the world of advanced manufacturing enters the sub-nanometer scale era, it is clear that ALD, MLD and SAM represent viable options for delivering the required few-atoms-thick layers required with uniformity, conformality, and purity.