Fri, 12 Dec 2015
In chemical mechanical planarization (CMP), the top surface of the wafer is polished or planarized to create a flat surface.
Mon, 10 Oct 2015
According to a new market research report published by MarketsandMarkets, the market is expected to grow at a CAGR of 6.83% between 2015 and 2020, and reach $4.94 Billion by 2020.
Wed, 7 Jul 2015
Chemical mechanical planarization (CMP) technology has been around for a long time. In addition to the semiconductor industry, CMP has applications in data storage, polishing the rigid disks and magnetic heads of hard-disk drives.
Tue, 10 Oct 2014
Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters.
Fri, 2 Feb 2014
Dow Electronic Materials, a business unit of The Dow Chemical Company, today introduced the IKONIC 4000 series of chemical mechanical planarization (CMP) polishing pads.
Tue, 1 Jan 2016
Entegris, Inc., a developer of yield-enhancing materials and solutions, today announced new post-chemical mechanical planarization (post-CMP) cleaning solutions for semiconductor manufacturing.
Tue, 2 Feb 2016
Nova Measuring Instruments, a provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today that a leading foundry recently selected Nova's optical and X-ray metrology solutions for multiple process steps.
Mon, 2 Feb 2016
A novel SACVD PMD invention sets the benchmark for helium reduction efforts by achieving four key objectives: cost reduction, quality, process robustness and productivity.
Fri, 9 Sep 2016
Cabot Microelectronics Corporation announced the appointment of Thomas F. Kelly, Vice President, Corporate Development, which is effective as of September 6, 2016.