Fri, 12 Dec 2015
Chemical vapor deposition (CVD) is used to produce high-purity thin films.
Thu, 12 Dec 2015
Reaction materials for chemical vapor deposition are typically delivered into the chamber in a gaseous form. The source materials can be gases or liquids.
Wed, 7 Jul 2015
There are four main segments in the thin-layer deposition equipment market – atomic layer deposition, chemical vapor deposition, epitaxy, and physical vapor deposition, also known as sputtering.
Tue, 2 Feb 2016
Nova Measuring Instruments, a provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today that a leading foundry recently selected Nova's optical and X-ray metrology solutions for multiple process steps.
Tue, 2 Feb 2016
The collaboration is expected to accelerate the development of highly-efficient, Gallium Nitride (GaN) based, power electronic devices using GaN Epi wafers created using Veeco's Propel Power GaN MOCVD system.
Thu, 2 Feb 2016
Veeco Instruments Inc. announced today the launch of the new TurboDisc K475i Arsenic Phosphide MOCVD System for the production of red, orange, yellow light emitting diodes.
Thu, 4 Apr 2016
Samco, a Japan-based semiconductor process equipment developer and manufacturer, is employing around 20 more people at its locations in North America, China, Taiwan and Singapore, as well as its subsidiary Samco-UCP in Liechtenstein.
Tue, 6 Jun 2016
Samco, a Japan-based semiconductor processing equipment manufacturer, held a completion ceremony for its second production center on June 17.
Wed, 7 Jul 2016
N2O, or Nitrous Oxide, also known as laughing gas, is a weak anesthetic gas that has been in use since the late 18th century.
Tue, 9 Sep 2017
Understanding the impact of valve flow coefficient (Cv) in fluid systems for microelectronics manufacturing.